Monday, February 28, 2011

Microelectronics Innovation Collaborative Centre licenses Alchimer’s wet deposition products for MEMS 3D research

MASSY, FRANCE & BROMONT, CANADA: Alchimer, a leading provider of nanometric deposition technology for through-silicon vias (TSVs), semiconductor interconnects, MEMS and other electronic applications, announced that the Centre de Collaboration MiQro Innovation/MiQro Innovation Collaborative Centre (C2MI) has licensed its suite of products.

The C2MI, which includes a state-of-the-art MEMS facility, was launched in 2009 by Université of Sherbrooke in Bromont Technoparc, Quebec, Canada. The center’s 200mm MEMS and 3D wafer-level-processing (WLP) equipment, which is among the most advanced in the world, will enable its members to test a variety of materials for MEMS production.

Alchimer’s suite of products and its Electrografting (eG) technology will support the center’s 3D MEMS programs. Electrografting is Alchimer’s breakthrough electrochemical process that enables the growth of extremely high-quality polymer and metal thin films.

“The MiQro Innovation Collaborative Centre and its members are at the leading edge of 3D integration in MEMS,” said Alchimer CEO Steve Lerner. “They are pushing the design rules in this space, and we are excited that they have chosen our products to support this work. This is another solid technical validation for Alchimer’s products and wet deposition technology.”

“Alchimer’s Electrografting technology dramatically increases yields in MEMS, 3D-IC and on-chip interconnects, and provides strong support for work in advancing the technology for 3D MEMS manufacturing with a cost-effective approach,” said Luc Ouellet, vice-president of R&D at Teledyne DALSA Semiconductor, the number-one pure-play MEMS foundry in the world.

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